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Effect of annealing temperature on microstructure and UV light photocatalytic activity of TiO2 films grown by atmospheric pressure CVD

หน่วยงาน Nanyang Technological University, Singapore

รายละเอียด

ชื่อเรื่อง : Effect of annealing temperature on microstructure and UV light photocatalytic activity of TiO2 films grown by atmospheric pressure CVD
นักวิจัย : Chua, Chin Sheng , Fang, Xiaoqin , Chen, Xiaofeng , Tan, Ooi Kiang , Tse, Man Siu , Soutar, Andrew McIntosh , Ding, Xingzhao
คำค้น : DRNTU::Science::Chemistry , DRNTU::Science::Chemistry::Crystallography::Chemical crystallography
หน่วยงาน : Nanyang Technological University, Singapore
ผู้ร่วมงาน : -
ปีพิมพ์ : 2557
อ้างอิง : Chua, C. S., Fang, X., Chen, X., Tan, O. K., Tse, M. S., Soutar, A. M., et al. (2014). Effect of annealing temperature on microstructure and UV light photocatalytic activity of TiO2 films grown by atmospheric pressure CVD. Chemical vapor deposition, 20(1-2-3), 44-50. , 0948-1907 , http://hdl.handle.net/10220/25098 , http://dx.doi.org/10.1002/cvde.201207015
ที่มา : -
ความเชี่ยวชาญ : -
ความสัมพันธ์ : Chemical vapor deposition
ขอบเขตของเนื้อหา : -
บทคัดย่อ/คำอธิบาย :

Titanium dioxide (TiO2) films are deposited on quartz substrates by atmospheric pressure (AP)CVD, and then annealed under simulated air (80% nitrogen, 20% oxygen) at temperatures from 600 to 900 °C to investigate the change in microstructure and the effect on the photocatalytic activity on the simulated pollutant stearic acid. The as-deposited TiO2 film is mainly composed of pure anatase phase while the rutile phase is detected only after annealing the film at 900 °C for 1 h. The photocatalytic activity of the annealed films on stearic acid under UV irradiation is found to deteriorate after the films are annealed at temperatures above 700 °C. This decrease in photocatalytic performance is observed to be the result of two possible mechanisms induced by the annealing temperature. The first mechanism is the increase in defect concentration (O− and Ti vacancies) in the annealed TiO2 films for annealing temperatures below 800 °C, and the second mechanism is the formation of large rutile grains at a higher temperature, 900 °C.

บรรณานุกรม :
Chua, Chin Sheng , Fang, Xiaoqin , Chen, Xiaofeng , Tan, Ooi Kiang , Tse, Man Siu , Soutar, Andrew McIntosh , Ding, Xingzhao . (2557). Effect of annealing temperature on microstructure and UV light photocatalytic activity of TiO2 films grown by atmospheric pressure CVD.
    กรุงเทพมหานคร : Nanyang Technological University, Singapore.
Chua, Chin Sheng , Fang, Xiaoqin , Chen, Xiaofeng , Tan, Ooi Kiang , Tse, Man Siu , Soutar, Andrew McIntosh , Ding, Xingzhao . 2557. "Effect of annealing temperature on microstructure and UV light photocatalytic activity of TiO2 films grown by atmospheric pressure CVD".
    กรุงเทพมหานคร : Nanyang Technological University, Singapore.
Chua, Chin Sheng , Fang, Xiaoqin , Chen, Xiaofeng , Tan, Ooi Kiang , Tse, Man Siu , Soutar, Andrew McIntosh , Ding, Xingzhao . "Effect of annealing temperature on microstructure and UV light photocatalytic activity of TiO2 films grown by atmospheric pressure CVD."
    กรุงเทพมหานคร : Nanyang Technological University, Singapore, 2557. Print.
Chua, Chin Sheng , Fang, Xiaoqin , Chen, Xiaofeng , Tan, Ooi Kiang , Tse, Man Siu , Soutar, Andrew McIntosh , Ding, Xingzhao . Effect of annealing temperature on microstructure and UV light photocatalytic activity of TiO2 films grown by atmospheric pressure CVD. กรุงเทพมหานคร : Nanyang Technological University, Singapore; 2557.