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OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps

หน่วยงาน Nanyang Technological University, Singapore

รายละเอียด

ชื่อเรื่อง : OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps
นักวิจัย : Zhou, Xiaozhu , Shade, Chad M. , Schmucker, Abrin L. , Brown, Keith A. , He, Shu , Boey, Freddy Yin Chiang , Ma, Jan , Zhang, Hua , Mirkin, Chad A.
คำค้น : -
หน่วยงาน : Nanyang Technological University, Singapore
ผู้ร่วมงาน : -
ปีพิมพ์ : 2555
อ้างอิง : Zhou, X., Shade, C. M., Schmucker, A. L., Brown, K. A., He, S., Boey, F., et al. (2012). OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps. Nano Letters, 12(9), 4734-4737. , http://hdl.handle.net/10220/11110 , http://dx.doi.org/10.1021/nl302171z
ที่มา : -
ความเชี่ยวชาญ : -
ความสัมพันธ์ : Nano letters
ขอบเขตของเนื้อหา : -
บทคัดย่อ/คำอธิบาย :

We report a simple and highly efficient method for creating graphene nanostructures with gaps that can be controlled on the sub-10 nm length scale by utilizing etch masks comprised of electrochemically synthesized multisegmented metal nanowires. This method involves depositing striped nanowires with Au and Ni segments on a graphene-coated substrate, chemically etching the Ni segments, and using a reactive ion etch to remove the graphene not protected by the remaining Au segments. Graphene nanoribbons with gaps as small as 6 nm are fabricated and characterized with atomic force microscopy, scanning electron microscopy, and Raman spectroscopy. The high level of control afforded by electrochemical synthesis of the nanowires allows us to specify the dimensions of the nanoribbon, as well as the number, location, and size of nanogaps within the nanoribbon. In addition, the generality of this technique is demonstrated by creating silicon nanostructures with nanogaps.

บรรณานุกรม :
Zhou, Xiaozhu , Shade, Chad M. , Schmucker, Abrin L. , Brown, Keith A. , He, Shu , Boey, Freddy Yin Chiang , Ma, Jan , Zhang, Hua , Mirkin, Chad A. . (2555). OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps.
    กรุงเทพมหานคร : Nanyang Technological University, Singapore.
Zhou, Xiaozhu , Shade, Chad M. , Schmucker, Abrin L. , Brown, Keith A. , He, Shu , Boey, Freddy Yin Chiang , Ma, Jan , Zhang, Hua , Mirkin, Chad A. . 2555. "OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps".
    กรุงเทพมหานคร : Nanyang Technological University, Singapore.
Zhou, Xiaozhu , Shade, Chad M. , Schmucker, Abrin L. , Brown, Keith A. , He, Shu , Boey, Freddy Yin Chiang , Ma, Jan , Zhang, Hua , Mirkin, Chad A. . "OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps."
    กรุงเทพมหานคร : Nanyang Technological University, Singapore, 2555. Print.
Zhou, Xiaozhu , Shade, Chad M. , Schmucker, Abrin L. , Brown, Keith A. , He, Shu , Boey, Freddy Yin Chiang , Ma, Jan , Zhang, Hua , Mirkin, Chad A. . OWL-based nanomasks for preparing graphene ribbons with sub-10 nm gaps. กรุงเทพมหานคร : Nanyang Technological University, Singapore; 2555.