ชื่อเรื่อง | : | Static dielectric constant of isolated silicon nanocrystals embedded in a SiO2 thin film |
นักวิจัย | : | Ng, Chi Yung , Chen, Tupei , Ding, Liang , Liu, Yang , Fung, Stevenson Hon Yuen , Tse, Man Siu , Dong, Zhili |
คำค้น | : | DRNTU::Engineering::Electrical and electronic engineering::Nanoelectronics |
หน่วยงาน | : | Nanyang Technological University, Singapore |
ผู้ร่วมงาน | : | - |
ปีพิมพ์ | : | 2549 |
อ้างอิง | : | Ng, C. Y., Chen, T. P., Ding, L., Liu, Y., Fung, S. H. Y., Tse, M. S., et al. (2006). Static dielectric constant of isolated silicon nanocrystals embedded in a SiO2 thin film. Applied Physics Letters, 88, 1-3. , 0003-6951 , http://hdl.handle.net/10220/6406 , http://dx.doi.org/10.1063/1.2172009 |
ที่มา | : | - |
ความเชี่ยวชาญ | : | - |
ความสัมพันธ์ | : | Applied physics letters |
ขอบเขตของเนื้อหา | : | - |
บทคัดย่อ/คำอธิบาย | : | The static dielectric constant of isolated silicon nanocrystals (nc-Si) embedded in a SiO2 thin film synthesized by Si+ implantation has been determined from capacitance measurement based on the Maxwell–Garnett effective medium approximation and the stopping and range of ions in matter simulation. For the nc-Si with a mean size of ∼ 4.5 nm, the dielectric constant so determined is 9.8, being consistent with a theoretical prediction. This value is significantly lower than the static dielectric constant (11.9) of bulk crystalline Si, indicating the significance of nc-Si size effect. The information of nc-Si dielectric constant is not only important to the fundamental physics but also useful to the design and modeling of nc-Si-based memory devices. |
บรรณานุกรม | : |
Ng, Chi Yung , Chen, Tupei , Ding, Liang , Liu, Yang , Fung, Stevenson Hon Yuen , Tse, Man Siu , Dong, Zhili . (2549). Static dielectric constant of isolated silicon nanocrystals embedded in a SiO2 thin film.
กรุงเทพมหานคร : Nanyang Technological University, Singapore. Ng, Chi Yung , Chen, Tupei , Ding, Liang , Liu, Yang , Fung, Stevenson Hon Yuen , Tse, Man Siu , Dong, Zhili . 2549. "Static dielectric constant of isolated silicon nanocrystals embedded in a SiO2 thin film".
กรุงเทพมหานคร : Nanyang Technological University, Singapore. Ng, Chi Yung , Chen, Tupei , Ding, Liang , Liu, Yang , Fung, Stevenson Hon Yuen , Tse, Man Siu , Dong, Zhili . "Static dielectric constant of isolated silicon nanocrystals embedded in a SiO2 thin film."
กรุงเทพมหานคร : Nanyang Technological University, Singapore, 2549. Print. Ng, Chi Yung , Chen, Tupei , Ding, Liang , Liu, Yang , Fung, Stevenson Hon Yuen , Tse, Man Siu , Dong, Zhili . Static dielectric constant of isolated silicon nanocrystals embedded in a SiO2 thin film. กรุงเทพมหานคร : Nanyang Technological University, Singapore; 2549.
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